Microleakage of "All-in-One" Adhesive Systems on Enamel and Dentinal Margins: An In Vitro Study

• Main Authors: M. Moezizadeh, S. Moayedi
• Format: Article
• Language: English
• Published: Tehran University of Medical Sciences 2008-03-01
• Series: Journal of Dentistry of Tehran University of Medical Sciences
• Subjects: Dentin-Bonding Agents; Dental Leakage; Prompt L-Pop; Prime and Bond NT; Unifil Bond; Z100 Composite Resin
• Online Access: http://journals.tums.ac.ir/upload_files/pdf/11983.pdf

Objective: The use of presently available dentin bonding systems has greatly reduced mi-croleakage; however, the ideal situation where the adhesive resin completely penetrates the demineralized dentin is not yet achieved. The purpose was to compare the microleak-age of fifth and sixth generation bonding agents at enamel and dentinal margins.Materials and Methods: Class V cavities were prepared at the CEJ of thirty extracted human premolars. The teeth were divided into three groups (n=10). In group I, cavities were treated with Prime&Bond NT; in group II, UniFil Bond; and in group III, Prompt L-Pop bonding agents were used following which composite resin (Z100) was placed incre-mentally. The specimens were stored in an environment of 100% humidity, immersed in a fresh solution of 50% Silver Nitrate each for 24 hours and then placed in a developing so-lution for 8 hours. After rinsing and being sectioned buccolingually through the center of the restoration, the samples were evaluated under a stereomicroscope at x50 magnificationfor microleakage along occlusal and gingival margins. The data were analyzed using Kruskal-Wallis and Multiple Comparison tests.Results: There wasa significant difference between the three groups. The fifth generation dentin bonding agent (Prime&Bond NT) showed the least amount of microleakage, while the sixth generation ones (UniFil Bond and Prompt L-Pop) showed higher amounts at enamel and dentinal margins.Conclusion: Fifth generation bonding agents seem to generate better results than those of sixth generation.