Radiation hardness of silicon doped by germanium with high concentration of free oxygen
Radiation hardness of Czochralski grown n-type silicon samples, doped by germanium (NGe = 2 ⋅ 1020 cm-3) and without that was investigated after irradiaton by fast neutrons of WWR-M reactor at room temperature.The dependence of effective carrier concentration on fluence was described in the framew...
Main Authors: | , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
Institute for Nuclear Research, National Academy of Sciences of Ukraine
2006-06-01
|
Series: | Âderna Fìzika ta Energetika |
Online Access: | http://jnpae.kinr.kiev.ua/17(1)/Articles_PDF/jnpae-2006-1(17)-0060-Varentsov.pdf |