Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr...

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Main Authors: Yong-Hyun Kim, Ji-Ho Cho, Jong-Sik Kim, Jong-Bae Park, Dae-Chul Kim, Young-Woo Kim
Format: Article
Language:English
Published: MDPI AG 2021-08-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/11/9/1025
id doaj-c9283fac2c9d4a18acf625e271ed7513
record_format Article
spelling doaj-c9283fac2c9d4a18acf625e271ed75132021-09-25T23:55:59ZengMDPI AGCoatings2079-64122021-08-01111025102510.3390/coatings11091025Comprehensive Data Collection Device for Plasma Equipment Intelligence StudiesYong-Hyun Kim0Ji-Ho Cho1Jong-Sik Kim2Jong-Bae Park3Dae-Chul Kim4Young-Woo Kim5Fundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaPlasma E.I. Convergence Research Center, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaFundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaFundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaFundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaFundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, Gunsan-si 54004, KoreaIn this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (n<sub>e</sub>), electron temperature (T<sub>e</sub>), plasma potential (V<sub>p</sub>), and floating potential (V<sub>f</sub>) were measured using several instruments (VI probe and mass/energy analyzer, etc.) and subsequently analyzed. Regression analysis was performed to correlate the measured data with the plasma parameters. As a result, the plasma density (n<sub>e</sub>) and temperature (T<sub>e</sub>) were observed to be in good agreement with the non-invasive measurement results. In particular, the VI probes were highly correlated with almost all the measured plasma parameters. Therefore, the results of this study provide a basis for the estimation of plasma parameters using non-invasive measurement techniques.https://www.mdpi.com/2079-6412/11/9/1025plasma parametersplasma diagnosticsnon-invasive methodregressiondata collection
collection DOAJ
language English
format Article
sources DOAJ
author Yong-Hyun Kim
Ji-Ho Cho
Jong-Sik Kim
Jong-Bae Park
Dae-Chul Kim
Young-Woo Kim
spellingShingle Yong-Hyun Kim
Ji-Ho Cho
Jong-Sik Kim
Jong-Bae Park
Dae-Chul Kim
Young-Woo Kim
Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
Coatings
plasma parameters
plasma diagnostics
non-invasive method
regression
data collection
author_facet Yong-Hyun Kim
Ji-Ho Cho
Jong-Sik Kim
Jong-Bae Park
Dae-Chul Kim
Young-Woo Kim
author_sort Yong-Hyun Kim
title Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
title_short Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
title_full Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
title_fullStr Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
title_full_unstemmed Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies
title_sort comprehensive data collection device for plasma equipment intelligence studies
publisher MDPI AG
series Coatings
issn 2079-6412
publishDate 2021-08-01
description In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (n<sub>e</sub>), electron temperature (T<sub>e</sub>), plasma potential (V<sub>p</sub>), and floating potential (V<sub>f</sub>) were measured using several instruments (VI probe and mass/energy analyzer, etc.) and subsequently analyzed. Regression analysis was performed to correlate the measured data with the plasma parameters. As a result, the plasma density (n<sub>e</sub>) and temperature (T<sub>e</sub>) were observed to be in good agreement with the non-invasive measurement results. In particular, the VI probes were highly correlated with almost all the measured plasma parameters. Therefore, the results of this study provide a basis for the estimation of plasma parameters using non-invasive measurement techniques.
topic plasma parameters
plasma diagnostics
non-invasive method
regression
data collection
url https://www.mdpi.com/2079-6412/11/9/1025
work_keys_str_mv AT yonghyunkim comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
AT jihocho comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
AT jongsikkim comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
AT jongbaepark comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
AT daechulkim comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
AT youngwookim comprehensivedatacollectiondeviceforplasmaequipmentintelligencestudies
_version_ 1717367522234204160