| Summary: | In the displacement measurement of the wafer stage in lithography machines, signal quality is affected by the relative angular position between the encoder head and the grating. In this study, a two-degree-of-freedom fiber-coupled heterodyne grating interferometer with large operating range of rotation is presented. Fibers without fiber couplers are utilized to receive the interference beams for high-contrast signals under the circumstances of large angular displacement and ZEMAX ray tracing software simulation and experimental validation have been carried out. Meanwhile, a reference beam generated inside the encoder head is adopted to suppress the thermal drift of the interferometer. Experimental results prove that the proposed grating interferometer could realize sub-nanometer displacement measurement stability in both in-plane and out-of-plane directions, which is 0.246 nm and 0.465 nm of 3σ value respectively within 30 s.
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