Aberration-Based Quality Metrics in Holographic Lenses

• Main Authors: Tomás Lloret, Víctor Navarro-Fuster, Manuel G. Ramírez, Marta Morales-Vidal, Augusto Beléndez, Inmaculada Pascual
• Format: Article
• Language: English
• Published: MDPI AG 2020-04-01
• Series: Polymers
• Subjects: holographic lenses; low toxicity photopolymer; optical quality; aberrations
• Online Access: https://www.mdpi.com/2073-4360/12/4/993

Aberrations and the image quality of holographic lenses were evaluated by a Hartmann–Shack (HS) wavefront sensor. Two lenses, one recorded with a symmetrical configuration and the other with an asymmetrical one, were stored in a photopolymer called Biophotopol. Each was reconstructed with two different wavelengths, 473 nm and 633 nm. Different metrics were applied to determine and quantify the aberration of the lenses (Zernike coefficients, Seidel coefficients, Marechal tolerances, root-mean-square (RMS), peak to valley, critical fraction of the pupil), and the quality of the image they provided (Strehl ratio, entropy, cutoff frequency, modulation transfer function (MTF), and area under the MTF). Good agreement between the metrics related to optical quality was obtained. The negative asymmetric holographic lenses had less aberration than the positive symmetric ones.