Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere

Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere

Nanostructured TiO2 films were grown on a monocrystalline silicon substrate by a femtosecond pulsed laser ablating a Ti target in atmosphere without a vacuum chamber. FESEM and XPS results showed that the TiO2 nanomaterials prepared by this method have a fluffy structure composed of nanoparticles wh...

Full description

Bibliographic Details
Main Authors: Bingpan Gao, Shengkong Zhang, Xuewei Ju, Yanzhang Lin, Xiangfeng Wang
Format: Article
Language:English
Published: AIP Publishing LLC 2017-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4997398
id doaj-c600135c5deb4799949c652e90336587
record_format Article
spelling doaj-c600135c5deb4799949c652e903365872020-11-24T22:39:55ZengAIP Publishing LLCAIP Advances2158-32262017-09-0179095206095206-710.1063/1.4997398036709ADVFemtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphereBingpan Gao0Shengkong Zhang1Xuewei Ju2Yanzhang Lin3Xiangfeng Wang4State Key Laboratory of Photocatalysis on Energy and Environment, School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. ChinaState Key Laboratory of Photocatalysis on Energy and Environment, School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. ChinaState Key Laboratory of Photocatalysis on Energy and Environment, School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. ChinaState Key Laboratory of Photocatalysis on Energy and Environment, School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. ChinaState Key Laboratory of Photocatalysis on Energy and Environment, School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. ChinaNanostructured TiO2 films were grown on a monocrystalline silicon substrate by a femtosecond pulsed laser ablating a Ti target in atmosphere without a vacuum chamber. FESEM and XPS results showed that the TiO2 nanomaterials prepared by this method have a fluffy structure composed of nanoparticles which have a particle size in the range of 1-100 nm, resulting in a high specific surface area of 88.6 m2/g. XRD results showed that the deposited films have a composited phase which is composed of anatase, rutile and amorphous TiO2. The reason for the formation of this nanostructure is mainly because of the collision with gas molecules and oxidation reaction of Ti ions. The method may be used to prepare other metal oxide nanostructured films.http://dx.doi.org/10.1063/1.4997398
collection DOAJ
language English
format Article
sources DOAJ
author Bingpan Gao
Shengkong Zhang
Xuewei Ju
Yanzhang Lin
Xiangfeng Wang
spellingShingle Bingpan Gao
Shengkong Zhang
Xuewei Ju
Yanzhang Lin
Xiangfeng Wang
Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
AIP Advances
author_facet Bingpan Gao
Shengkong Zhang
Xuewei Ju
Yanzhang Lin
Xiangfeng Wang
author_sort Bingpan Gao
title Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
title_short Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
title_full Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
title_fullStr Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
title_full_unstemmed Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere
title_sort femtosecond pulsed laser deposition of nanostructured tio2 films in atmosphere
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2017-09-01
description Nanostructured TiO2 films were grown on a monocrystalline silicon substrate by a femtosecond pulsed laser ablating a Ti target in atmosphere without a vacuum chamber. FESEM and XPS results showed that the TiO2 nanomaterials prepared by this method have a fluffy structure composed of nanoparticles which have a particle size in the range of 1-100 nm, resulting in a high specific surface area of 88.6 m2/g. XRD results showed that the deposited films have a composited phase which is composed of anatase, rutile and amorphous TiO2. The reason for the formation of this nanostructure is mainly because of the collision with gas molecules and oxidation reaction of Ti ions. The method may be used to prepare other metal oxide nanostructured films.
url http://dx.doi.org/10.1063/1.4997398
work_keys_str_mv AT bingpangao femtosecondpulsedlaserdepositionofnanostructuredtio2filmsinatmosphere
AT shengkongzhang femtosecondpulsedlaserdepositionofnanostructuredtio2filmsinatmosphere
AT xueweiju femtosecondpulsedlaserdepositionofnanostructuredtio2filmsinatmosphere
AT yanzhanglin femtosecondpulsedlaserdepositionofnanostructuredtio2filmsinatmosphere
AT xiangfengwang femtosecondpulsedlaserdepositionofnanostructuredtio2filmsinatmosphere
_version_ 1725706887748386816

Similar Items