3D-microfabrication by two-photon polymerization of an integrated sacrificial stencil mask
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by exploiting Two-Photon Polymerization (2PP) in an IP-L/SU-8 double layer resist system. The process consists of the sequential deposition of two different resists, such as SU-8 and IPL, onto the same gl...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2019-03-01
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| Series: | Micro and Nano Engineering |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007219300048 |