Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence

• Main Authors: Rômulo Augusto Ando, Keiko Takashima, Eduardo Niehues
• Format: Article
• Language: English
• Published: Universidade Estadual de Londrina 2006-02-01
• Series: Semina: Ciências Exatas e Tecnológicas
• Subjects: Ácido mandélico; a-hidroxiácido; Oxidação por vanádio(V)M.
• Online Access: http://www.uel.br/revistas/uel/index.php/semexatas/article/view/1877

The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V).