RF plasma generation in the chamber with the conducting walls

RF plasma generation in the chamber with the conducting walls

This work is devoted to study of inductively coupled RF discharge within a metal chamber with a diameter of about 1 m and a length of about 2 m in argon gas (RF frequency is 5.28 MHz). The spatial distributions of electron temperature and density depending on the magnetic induction (from 0 to 0.2 T)...

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Bibliographic Details
Main Authors: Gavrikov Andey, Kuzmichev Sergey, Lizyakin Gennadiy, Smirnov Valentin, Timirkhanov Rinat, Usmanov Ravil, Vorona Nazar
Format: Article
Language:English
Published: EDP Sciences 2017-01-01
Series:EPJ Web of Conferences
Online Access:https://doi.org/10.1051/epjconf/201715703062
Description
Summary:This work is devoted to study of inductively coupled RF discharge within a metal chamber with a diameter of about 1 m and a length of about 2 m in argon gas (RF frequency is 5.28 MHz). The spatial distributions of electron temperature and density depending on the magnetic induction (from 0 to 0.2 T), plasma-forming gas pressure (0.1 − 10 mTorr) and RF power absorbed in the plasma are presented. For fixed gas pressure (6 mTorr) electron temperature decrease with increasing of magnetic field was found.
ISSN:2100-014X

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