Avaliação da atividade antimicrobiana de soluções de flumequina submetidas aos processos eletroquímico e foto-eletroquímico

• Main Authors: Caio Rodrigues-Silva, Milena G. Maniero, José Roberto Guimarães
• Format: Article
• Language: English
• Published: Sociedade Brasileira de Química 2014-06-01
• Series: Química Nova
• Subjects: advanced oxidation processes; degradation; fluoroquinolone
• Online Access: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422014000500006&lng=en&tlng=en
• ISSN: 1678-7064

Flumequine degradation by electrochemical and photo-electrochemical processes was evaluated in this study. The antimicrobial activity of the solutions subjected to the electrochemical processes was monitored during the assays. The experiments were carried out using DSA® (dimensionally stable anode) electrode. The influence of current density was investigated for the 7.5 to 45 mA cm-2 range. The photo-electrochemical process was more efficient for degrading flumequine (85%) and reducing solution antimicrobial activity. For both processes, the residual antimicrobial activity decreased as flumequine degradation increased. The reaction intermediate m/z 244 (5-methyl-1-oxo-6,7-dihydro-1H,5H-pyrido[3,2,1-ij]quinoline-2-carboxylic acid) was identified.