Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO<sub>2</sub> Thin Films with Enhanced Mechanical and Optical Properties

Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO<sub>2</sub> Thin Films with Enhanced Mechanical and Optical Properties

In this contribution, based on the detailed understanding of the processes’ characteristics during reactive high-power impulse magnetron sputtering (HiPIMS), we demonstrated the deposition of silicon oxide (SiO<sub>2</sub>) thin films with improved optical and mechanical performances. A...

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Bibliographic Details
Main Authors: Vasile Tiron, Ioana-Laura Velicu, Teodora Matei, Daniel Cristea, Luis Cunha, George Stoian
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Coatings
Subjects:
reactive HiPIMS
silicon oxide
arcing
mechanical properties
Online Access:https://www.mdpi.com/2079-6412/10/7/633

Internet

https://www.mdpi.com/2079-6412/10/7/633

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