Sidewall profile reconstruction of microstructures with high aspect ratio based on near-infrared light scanning interferometry
Sidewall profile reconstruction of microstructures with the high aspect ratio is a problem urgently to be solved in MEMS field. In this paper, a measuring method based on near-infrared light scanning interferometry (NILSI) is presented according to the transmission principle of semiconductor materia...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2018-10-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5049494 |