The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters
The resonant type power supplies of medium frequency designed for magnetron sputtering processes often use pulse density modulation to regulate the average discharge power level. While the output power level changes then number of pulses in a group changes, but the discharge current pulses are the s...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Sciendo
2016-06-01
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| Series: | Materials Science-Poland |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/msp-2016-0012 |