Mechanical cleaning of graphene using in situ electron microscopy

Mechanical cleaning of graphene using in situ electron microscopy

Contamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically cl...

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Main Authors: Peter Schweizer, Christian Dolle, Daniela Dasler, Gonzalo Abellán, Frank Hauke, Andreas Hirsch, Erdmann Spiecker
Format: Article
Language:English
Published: Nature Publishing Group 2020-04-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-020-15255-3
id doaj-bceb979c9b3245528e032bcbf801fc91
record_format Article
spelling doaj-bceb979c9b3245528e032bcbf801fc912021-05-11T08:57:46ZengNature Publishing GroupNature Communications2041-17232020-04-011111910.1038/s41467-020-15255-3Mechanical cleaning of graphene using in situ electron microscopyPeter Schweizer0Christian Dolle1Daniela Dasler2Gonzalo Abellán3Frank Hauke4Andreas Hirsch5Erdmann Spiecker6Institute of Micro- and Nanostructure Research (IMN) and Center for Nanoanalysis and Electron Microscopy (CENEM), FAU Erlangen-NürnbergInstitute of Micro- and Nanostructure Research (IMN) and Center for Nanoanalysis and Electron Microscopy (CENEM), FAU Erlangen-NürnbergDepartment of Chemistry and Pharmacy and Joint Institute of Advanced Materials and Processes (ZMP), Chair of Organic Chemistry II, FAU Erlangen-NürnbergDepartment of Chemistry and Pharmacy and Joint Institute of Advanced Materials and Processes (ZMP), Chair of Organic Chemistry II, FAU Erlangen-NürnbergDepartment of Chemistry and Pharmacy and Joint Institute of Advanced Materials and Processes (ZMP), Chair of Organic Chemistry II, FAU Erlangen-NürnbergDepartment of Chemistry and Pharmacy and Joint Institute of Advanced Materials and Processes (ZMP), Chair of Organic Chemistry II, FAU Erlangen-NürnbergInstitute of Micro- and Nanostructure Research (IMN) and Center for Nanoanalysis and Electron Microscopy (CENEM), FAU Erlangen-NürnbergContamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically clean areas of several μm2 within minutes.https://doi.org/10.1038/s41467-020-15255-3
collection DOAJ
language English
format Article
sources DOAJ
author Peter Schweizer
Christian Dolle
Daniela Dasler
Gonzalo Abellán
Frank Hauke
Andreas Hirsch
Erdmann Spiecker
spellingShingle Peter Schweizer
Christian Dolle
Daniela Dasler
Gonzalo Abellán
Frank Hauke
Andreas Hirsch
Erdmann Spiecker
Mechanical cleaning of graphene using in situ electron microscopy
Nature Communications
author_facet Peter Schweizer
Christian Dolle
Daniela Dasler
Gonzalo Abellán
Frank Hauke
Andreas Hirsch
Erdmann Spiecker
author_sort Peter Schweizer
title Mechanical cleaning of graphene using in situ electron microscopy
title_short Mechanical cleaning of graphene using in situ electron microscopy
title_full Mechanical cleaning of graphene using in situ electron microscopy
title_fullStr Mechanical cleaning of graphene using in situ electron microscopy
title_full_unstemmed Mechanical cleaning of graphene using in situ electron microscopy
title_sort mechanical cleaning of graphene using in situ electron microscopy
publisher Nature Publishing Group
series Nature Communications
issn 2041-1723
publishDate 2020-04-01
description Contamination of 2D materials adversely impacts device performance and calls for cleaning methods down to the atomic scale and over large areas. Here, the authors present a site-specific mechanical cleaning approach capable of cleaning both sides of suspended 2D membranes and achieving atomically clean areas of several μm2 within minutes.
url https://doi.org/10.1038/s41467-020-15255-3
work_keys_str_mv AT peterschweizer mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT christiandolle mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT danieladasler mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT gonzaloabellan mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT frankhauke mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT andreashirsch mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
AT erdmannspiecker mechanicalcleaningofgrapheneusinginsituelectronmicroscopy
_version_ 1721450352641835008

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