Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer
In this letter, novel heterostructure p-i-n GaN avalanche photodiodes (APDs) with p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N layer are proposed and analyzed through Silvaco Atlas simulations. The introduction of the In<sub>0.05</sub>Ga<sub>0.95</sub>N...
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doaj-ba67cacf3a5446db89cc5366257ef8cf2021-03-29T17:58:07ZengIEEEIEEE Photonics Journal1943-06552020-01-011211610.1109/JPHOT.2020.29699918972413Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N LayerHaiping Wang0Haifan You1https://orcid.org/0000-0003-0099-6074Danfeng Pan2Dunjun Chen3Hai Lu4https://orcid.org/0000-0002-9835-6763Rong Zhang5Youdou Zheng6Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, ChinaIn this letter, novel heterostructure p-i-n GaN avalanche photodiodes (APDs) with p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N layer are proposed and analyzed through Silvaco Atlas simulations. The introduction of the In<sub>0.05</sub>Ga<sub>0.95</sub>N layer generates a negative polarization charge at the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N/i-GaN heterojunction interface via the piezoelectric polarization effect. Three times higher hole concentration in the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N layer is obtained due to the smaller activation energy of the Mg dopant. Induced polarization charge and increased hole concentration work together to reduce the voltage drop in the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N layer and enhance the electric field intensity in the i-GaN layer. The calculated results show that the heterostructure APD demonstrates a reduced operating voltage of more than 26 V and an improved multiplication gain by an order of magnitude in comparison to the conventional one.https://ieeexplore.ieee.org/document/8972413/GaNavalanche photodiodesp-type In<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.05}$</tex-math> </inline-formula>Ga<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.95}$</tex-math> </inline-formula>Npolarizationhole concentrationSilvaco |
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English |
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Article |
sources |
DOAJ |
author |
Haiping Wang Haifan You Danfeng Pan Dunjun Chen Hai Lu Rong Zhang Youdou Zheng |
spellingShingle |
Haiping Wang Haifan You Danfeng Pan Dunjun Chen Hai Lu Rong Zhang Youdou Zheng Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer IEEE Photonics Journal GaN avalanche photodiodes p-type In<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.05}$</tex-math> </inline-formula>Ga<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.95}$</tex-math> </inline-formula>N polarization hole concentration Silvaco |
author_facet |
Haiping Wang Haifan You Danfeng Pan Dunjun Chen Hai Lu Rong Zhang Youdou Zheng |
author_sort |
Haiping Wang |
title |
Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer |
title_short |
Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer |
title_full |
Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer |
title_fullStr |
Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer |
title_full_unstemmed |
Polarization Enhanced GaN Avalanche Photodiodes With p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N Layer |
title_sort |
polarization enhanced gan avalanche photodiodes with p-type in<sub>0.05</sub>ga<sub>0.95</sub>n layer |
publisher |
IEEE |
series |
IEEE Photonics Journal |
issn |
1943-0655 |
publishDate |
2020-01-01 |
description |
In this letter, novel heterostructure p-i-n GaN avalanche photodiodes (APDs) with p-type In<sub>0.05</sub>Ga<sub>0.95</sub>N layer are proposed and analyzed through Silvaco Atlas simulations. The introduction of the In<sub>0.05</sub>Ga<sub>0.95</sub>N layer generates a negative polarization charge at the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N/i-GaN heterojunction interface via the piezoelectric polarization effect. Three times higher hole concentration in the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N layer is obtained due to the smaller activation energy of the Mg dopant. Induced polarization charge and increased hole concentration work together to reduce the voltage drop in the p-In<sub>0.05</sub>Ga<sub>0.95</sub>N layer and enhance the electric field intensity in the i-GaN layer. The calculated results show that the heterostructure APD demonstrates a reduced operating voltage of more than 26 V and an improved multiplication gain by an order of magnitude in comparison to the conventional one. |
topic |
GaN avalanche photodiodes p-type In<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.05}$</tex-math> </inline-formula>Ga<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX">$_{0.95}$</tex-math> </inline-formula>N polarization hole concentration Silvaco |
url |
https://ieeexplore.ieee.org/document/8972413/ |
work_keys_str_mv |
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