Resistance abilities of （100）/（111）-faceted diamond films against oxygen plasma etching

Resistance abilities of （100）/（111）-faceted diamond films against oxygen plasma etching

The resistance abilities of (100) and (111)-faceted diamond films against oxygen plasma, 100 μm as film thickness, were investigated by the microwave power chemical vapor deposition (MPCVD) technique. The results indicate that the preferred etching points of the (100)-faceted diamond films are locat...

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Bibliographic Details
Main Authors: SUN Qi, WANG Jianhua, CHENG Chong, CHEN Xianglei, WU Rongjun, LIU Dan, ZHU Jiao
Format: Article
Language:zho
Published: Journal of Aeronautical Materials 2019-02-01
Series:Journal of Aeronautical Materials
Subjects:
diamond films
(100)-faceted
(111)-faceted
oxygen plasma
etching
Online Access:http://jam.biam.ac.cn/CN/Y2019/V39/I2/55

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