Improving External Quantum Efficiency by Subwavelength Nano Multi-Layered Structures for Optoelectronic Devices

• Main Authors: Dong Wang, Rui Zhou, Yinghui Wu, Houzhi Cai, Yueqiang Zhang
• Format: Article
• Language: English
• Published: IEEE 2020-01-01
• Series: IEEE Access
• Subjects: Anti-reflection; nano multi-layers; thin film optics; finite element method
• Online Access: https://ieeexplore.ieee.org/document/9224949/

Based on thin film optics (TFO) and finite element method (FEM), we have theoretically investigated improving external quantum efficiency (EQE) by anti-reflection (AR) films constructed from subwavelength nano multi-layers (NML) of low and high index materials, where the low and high index materials are MgF₂ and Ta₂O₅, respectively. This kind of NML dielectric structures have the advantages of low-cost and flexible. Three kinds of substrates have been studied here, which are glass, polyethylene naphthalate (PEN), and polyethylene terephthalate (PET), respectively. TFO theory has been used to obtain the transmittance and reflectance, which agrees well with FEM results. For NML structure, TFO is more efficient than FEM in terms of calculation time and accuracy. The average AR effects (AAREs) are about 3.69%, 3.46% and 3.07% on glass substrate, about 6.15%, 5.56% and 5.02% on PEN substrate, and about 5.06%, 4.62% and 4.17% on PET substrate, for AR bands (ARBs) 350~800 nm, 350~1100 nm and 350~1500 nm, respectively. The results also reflect that wider AR bandwidth needs more NML layers. In practice, this kind of AR films can be widely applicable to enhance the EQE of the optoelectronic devices (OEDs).