Promoting Effect of H⁺ and Other Factors on NO Removal by Using Acidic NaClO₂ Solution

• Main Authors: Pijian Gong, Xinxue Li
• Format: Article
• Language: English
• Published: MDPI AG 2019-08-01
• Series: Energies
• Subjects: sodium chlorite (NaClO₂); wet scrubbing; removal efficiency; NO reaction mechanism
• Online Access: https://www.mdpi.com/1996-1073/12/15/2966

In this study, NaClO₂ was selected as a denitration oxidant. In order to clarify the mechanism of NaClO₂ as an oxidation agent for NO removal efficiency, the effects of H⁺ and other factors (NaClO₂ concentration, temperature, and the other gas) on the NO removal efficiency were investigated. NaClO₂ showed a promotional ability on NO removal, whose efficiency increased with the increase of NaClO₂ concentration. One hundred percent removal efficiency of NO could be achieved when the NaClO₂ concentration was 0.014 mol/L. Furthermore, raising the reaction temperature benefited the removal of NO. The lower the pH, the better the NO removal efficiency. The promoting effect of H⁺ on the NO removal was studied by the Nernst equation, ionic polarization, and the generation of ClO₂. Under the optimal conditions, the best removal efficiency of NO was 100%. Based on the experimental results, the reaction mechanism was finally speculated.