Nanocrystalline Diamond Films Deformation Observed During Sliding Tests Against Si3N4 Balls
<p>The study investigates wear performance of nanocrystalline diamond (NCD) films under reciprocating sliding conditions. The NCD films were grown by hot-filament chemical vapor deposition (HFCVD) method on (100) oriented Si wafers. The surface morphology was characterized by atomic force micr...
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| Format: | Article |
| Language: | English |
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Kaunas University of Technology
2015-09-01
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| Series: | Medžiagotyra |
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| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/7232 |
| Summary: | <p>The study investigates wear performance of nanocrystalline diamond (NCD) films under reciprocating sliding conditions. The NCD films were grown by hot-filament chemical vapor deposition (HFCVD) method on (100) oriented Si wafers. The surface morphology was characterized by atomic force microscopy (AFM), scanning electron microscopy (SEM) and mechanical profilometry. The study focuses on the understanding of mechanisms resulting in NCD films deformation and formation of ripple patterns on the wear scars surface observed during reciprocal sliding tests. Plastic deformation of the Si wafer due to NCD film deposition and high local contact pressure and temperature during sliding lead to structural changes on the Si(100)/NCD film interface, thus causing the NCD film to deform and the characteristic ripple patterns to develop on the wear scars surface.</p><p> </p><p>DOI: <a href="http://dx.doi.org/10.5755/j01.ms.21.3.7232">http://dx.doi.org/10.5755/j01.ms.21.3.7232</a></p> |
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| ISSN: | 1392-1320 2029-7289 |