IMPROVED PROCESS FLOW FOR FORMATION OF BIPOLAR STATIC INDUCTION TRANSISTOR
The improved process flow differs from the known ones in the fact that the same photomask is used for formation of a channel stopper and metal contacts. Such approach has made it possible not only to decrease a number of the used phototomasks but it has also permitted to obtain a device with the req...
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| Format: | Article |
| Language: | Russian |
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Belarusian National Technical University
2018-02-01
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| Series: | Nauka i Tehnika |
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| Online Access: | https://sat.bntu.by/jour/article/view/1317 |