Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer
A three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer. This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%,...
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Series: | Journal of Sensors |
Online Access: | http://dx.doi.org/10.1155/2016/4019864 |
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doaj-b652514daa1147f28330c36814a9289d2020-11-24T22:26:45ZengHindawi LimitedJournal of Sensors1687-725X1687-72682016-01-01201610.1155/2016/40198644019864Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection LayerJing Jiang0Zhida Xu1Jiahao Lin2Gang Logan Liu3Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USADepartment of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USADepartment of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USADepartment of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USAA three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer. This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%, and increase the responsivity by 25.7%. This low-cost manufacture process can be applied to increase the responsivity of silicon based photonic devices.http://dx.doi.org/10.1155/2016/4019864 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Jing Jiang Zhida Xu Jiahao Lin Gang Logan Liu |
spellingShingle |
Jing Jiang Zhida Xu Jiahao Lin Gang Logan Liu Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer Journal of Sensors |
author_facet |
Jing Jiang Zhida Xu Jiahao Lin Gang Logan Liu |
author_sort |
Jing Jiang |
title |
Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer |
title_short |
Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer |
title_full |
Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer |
title_fullStr |
Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer |
title_full_unstemmed |
Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer |
title_sort |
lithography-free, low-cost method for improving photodiode performance by etching silicon nanocones as antireflection layer |
publisher |
Hindawi Limited |
series |
Journal of Sensors |
issn |
1687-725X 1687-7268 |
publishDate |
2016-01-01 |
description |
A three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer. This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%, and increase the responsivity by 25.7%. This low-cost manufacture process can be applied to increase the responsivity of silicon based photonic devices. |
url |
http://dx.doi.org/10.1155/2016/4019864 |
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