Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks

We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO2/SiO2/Si and Ti/SiO2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves...

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Bibliographic Details
Main Author: Elena O Filatova, Igor V Kozhevnikov, Andrey A Sokolov, Evgeniy V Ubyivovk, Sergey Yulin, Mihaela Gorgoi and Franz Schäfers
Format: Article
Language:English
Published: Taylor & Francis Group 2012-01-01
Series:Science and Technology of Advanced Materials
Online Access:http://iopscience.iop.org/1468-6996/13/1/015001

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