Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM

Growth behaviour and mechanical properties of PLL/HA multilayer films studied by AFM

Scanning- and colloidal-probe atomic force microscopy were used to study the mechanical properties of poly(L-lysine)/hyaluronan (PLL/HA)n films as a function of indentation velocity and the number of polymer deposition steps n. The film thickness was determined by two independent AFM-based methods:...

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Bibliographic Details
Main Authors: Cagri Üzüm, Johannes Hellwig, Narayanan Madaboosi, Dmitry Volodkin, Regine von Klitzing
Format: Article
Language:English
Published: Beilstein-Institut 2012-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
atomic force microscopy
polyelectrolyte multilayers
stress relaxation
viscoelasticity
Young’s modulus
Online Access:https://doi.org/10.3762/bjnano.3.87

Internet

https://doi.org/10.3762/bjnano.3.87

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