| Summary: | BNNP of (Boron Nitride) nanoparticlese thick films were grownup on the substrates of silicon and glass through a catalytic hybrid vapor deposited technique (PVD and CVD) in a horizontal electric tube furnace. Which that performed by a growth vapor catching access as guided by the nucleation theory. B-N film was deposited within an 0.5 h at the temperature (950 °C) under the mixture of nitrogen N2 and ammonia NH3 flow gases. The effect of growth temperature and catalysis surface (TiO2, Ni, multilayer of TiO2-Ni and graphene) on the structure and morphology for the powdered films of separate BNNPs were in a systematic investigated. XRD patterns evident the crystal formation phases C-BN as well as phases related to interaction of coating materials with substrates, catalyst of TiO2 was reflected growth and have highly intensity peaks diffracted for phase C-BN. Scherer and W–H calculations are employing to estimate particle size which that be in range of nanoscale, in addition to compressive and expansion micro strain which that to be (0.00132–0.00027) and (0.0011) respectively. SEM refereed BNNP films grown comprised of dispersed homogeneously with distinct nanoparticles in directions randomly. The BN thick film growth was conducted by the root growth pathway. These nanoparticles existed in a crowded web-like an configuration for the glass substrate, where the substrates whole surfaces were topped of this thick layer nanoparticles, indicating a big output quantity, characteristic of h-BN and C-BN peaks were evidences in the infrared spectra of both Si/TiO2 and Si/TiO2-Ni films for the existence of crystalline B-N film. Keywords: CVD, Catalyst, BNNP, Si, Ni, Tio2
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