Optical Interference and Self-Scattering Effect On Laser Ablation of Thin Silicon Films

We report measurement of the ablation depth and self-reflectivity from thin silicon films illuminated by a single tightly focused femtosecond laser pulse. We show the dependence of ablation depth on incident laser pulse fluence can be modeled with a transfer-matrix method, taking into account transi...

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Bibliographic Details
Main Authors: Zhang Hao, van Oosten D., Krol D. M., Dijkhuis J. I.
Format: Article
Language:English
Published: EDP Sciences 2013-11-01
Series:MATEC Web of Conferences
Online Access:http://dx.doi.org/10.1051/matecconf/20130804011
Description
Summary:We report measurement of the ablation depth and self-reflectivity from thin silicon films illuminated by a single tightly focused femtosecond laser pulse. We show the dependence of ablation depth on incident laser pulse fluence can be modeled with a transfer-matrix method, taking into account transient reflectivity and light propagation in a stratified medium. We find optical interference effects in laser ablation of thin films are of crucial importance. Furthermore, We present the evidence of self-scattering effects due to the buildup of a three dimensional submicron sized plasma in the focal region.
ISSN:2261-236X