Analysis of TSV-Induced Mechanical Stress and Electrical Noise Coupling in Sub 5-nm Node Nanosheet FETs for Heterogeneous 3D-ICs
Through-silicon via (TSV)-induced mechanical stress and electrical noise coupling effects on sub 5-nm node nanosheet field-effect transistors (NSFETs) were investigated comprehensively compared to fin-shaped FETs (FinFETs) using TCAD for heterogeneous 3D-ICs. TSV-induced channel length directional s...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2021-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9333571/ |