Simultaneous fabrication of line defects-embedded periodic lattice by topographically assisted holographic lithography

• Main Authors: Kim Ki Seok, Choi Byung-Yeon, Pak Yusin, Lee Kwang-Ho, Jung Gun-Young
• Format: Article
• Language: English
• Published: SpringerOpen 2011-01-01
• Series: Nanoscale Research Letters
• Subjects: hot-embossing; holographic lithography; phase-shift lithography; photonic crystal; defect generation
• Online Access: http://www.nanoscalereslett.com/content/6/1/449

<p>Abstract</p> <p>We have demonstrated simultaneous fabrication of designed defects within a periodic structure. For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed. Hot-embossing method generated the photoresist patterns with vertical side walls which enabled phase-shift mask effect at the edge of patterns. Embossing temperature and relief height were crucial parameters for the successful TAHL process. Periodic holes with a diameter of 600 nm at a 1 &#956;m-pitch incorporating 250 nm wide line-defects were obtained simultaneously.</p>