Effect of Annealing on the Microstructure and SERS Performance of Mo-48.2% Ag Films

Mo-48.2% Ag films were fabricated by direct current (DC) magnetron sputtering and annealed in an argon atmosphere. The effects of annealing on the surface morphology, resistivity and surface-enhanced Raman scattering (SERS) performance of Mo-48.2% Ag films were investigated. Results show a mass of p...

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Bibliographic Details
Main Authors: Haoliang Sun, Xinxin Lian, Yuanjiang Lv, Yuanhao Liu, Chao Xu, Jiwei Dai, Yilin Wu, Guangxin Wang
Format: Article
Language:English
Published: MDPI AG 2020-09-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/13/18/4205
Description
Summary:Mo-48.2% Ag films were fabricated by direct current (DC) magnetron sputtering and annealed in an argon atmosphere. The effects of annealing on the surface morphology, resistivity and surface-enhanced Raman scattering (SERS) performance of Mo-48.2% Ag films were investigated. Results show a mass of polyhedral Ag particles grown on the annealed Mo-48.2% Ag films’ surface, which are different from that of as-deposited Mo-Ag film. Moreover, the thickness and the resistivity of Mo-48.2% Ag films gradually decrease as the annealing temperature increases. Furthermore, finite-difference time-domain (FDTD) simulations proved that the re-deposition Ag layer increases the “hot spots” between adjacent Ag nanoparticles, thereby greatly enhancing the local electromagnetic (EM) field. The Ag layer/annealed Mo-48.2% Ag films can identify crystal violet (CV) with concentration lower than 5 × 10<sup>−10</sup> M (1 mol/L = 1 M), which indicated that this novel type of particles/films can be applied as ultrasensitive SERS substrates.
ISSN:1996-1944