Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase

The formation of MeSiH is the primary process in the photolysis of 1,2-dimethyldisilane at 193 nm that are analogues of carbenes. Gas chromatographic technique was used with a flame ionization detector as an analysis tool to identify the products mixture. The photolysis light at 193 nm was provided...

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Main Author: Najem Al-Rubaiey
Format: Article
Language:English
Published: Elsevier 2019-04-01
Series:Data in Brief
Online Access:http://www.sciencedirect.com/science/article/pii/S2352340918309260
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spelling doaj-a9825f2ef0544f1d873d5d318a6d77ee2020-11-25T01:17:51ZengElsevierData in Brief2352-34092019-04-0123Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phaseNajem Al-Rubaiey0Petroleum Technology Department, University of Technology, Baghdad, IraqThe formation of MeSiH is the primary process in the photolysis of 1,2-dimethyldisilane at 193 nm that are analogues of carbenes. Gas chromatographic technique was used with a flame ionization detector as an analysis tool to identify the products mixture. The photolysis light at 193 nm was provided by an Oxford KX2 pulsed laser operated with rare-gas halide (known as an excimer laser) as the gain medium to provide ultraviolet (UV) radiation. This work has confirmed that radical processes are not important in the photolysis of 1,2-dimethyldisilane. A method for the determination of rate constants for MeSiH reactions relative to the rate constants of 1,2-dimethyldisilane has been formulated. This has been used to determine some relative rate constants of MeSiH insertions with methylsilanes. The insertion reactions of MeSiH with SiH4 and Methysilanes have shown to be fast and closer in reactivity to SiH2 than to SiMe2, whereas PhSiH looks to be slightly more reactive than MeSiH.http://www.sciencedirect.com/science/article/pii/S2352340918309260
collection DOAJ
language English
format Article
sources DOAJ
author Najem Al-Rubaiey
spellingShingle Najem Al-Rubaiey
Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
Data in Brief
author_facet Najem Al-Rubaiey
author_sort Najem Al-Rubaiey
title Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
title_short Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
title_full Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
title_fullStr Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
title_full_unstemmed Ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
title_sort ultraviolet photolysis of 1,2-dimethyldisilane in the gas phase
publisher Elsevier
series Data in Brief
issn 2352-3409
publishDate 2019-04-01
description The formation of MeSiH is the primary process in the photolysis of 1,2-dimethyldisilane at 193 nm that are analogues of carbenes. Gas chromatographic technique was used with a flame ionization detector as an analysis tool to identify the products mixture. The photolysis light at 193 nm was provided by an Oxford KX2 pulsed laser operated with rare-gas halide (known as an excimer laser) as the gain medium to provide ultraviolet (UV) radiation. This work has confirmed that radical processes are not important in the photolysis of 1,2-dimethyldisilane. A method for the determination of rate constants for MeSiH reactions relative to the rate constants of 1,2-dimethyldisilane has been formulated. This has been used to determine some relative rate constants of MeSiH insertions with methylsilanes. The insertion reactions of MeSiH with SiH4 and Methysilanes have shown to be fast and closer in reactivity to SiH2 than to SiMe2, whereas PhSiH looks to be slightly more reactive than MeSiH.
url http://www.sciencedirect.com/science/article/pii/S2352340918309260
work_keys_str_mv AT najemalrubaiey ultravioletphotolysisof12dimethyldisilaneinthegasphase
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