Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

The physical properties including the mechanical, optical and electrical properties of Ti nitrides and silicides are very attractive for many applications such as protective coatings, barriers of diffusion, interconnects and so on. The simultaneous formation of nitrides and silicides in Ti films imp...

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Bibliographic Details
Main Authors: Isabelle Jauberteau, Richard Mayet, Julie Cornette, Denis Mangin, Annie Bessaudou, Pierre Carles, Jean Louis Jauberteau, Armand Passelergue
Format: Article
Language:English
Published: MDPI AG 2017-02-01
Series:Coatings
Subjects:
expanding plasma
nitriding process
thin films
titanium silicides
titanium nitrides
X-ray diffraction
Raman spectroscopy
secondary ion mass spectrometry
transmission electron microscopy
Online Access:http://www.mdpi.com/2079-6412/7/2/23

Internet

http://www.mdpi.com/2079-6412/7/2/23

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