The effect of PECVD plasma decomposition on the wettability and dielectric constant changes in silicon modified DLC films for potential MEMS and low stiction applications
We have carried out investigations aimed at understanding the mechanism responsible for a water contact angle increase of up to ten degrees and a decrease in dielectric constant in silicon modified hydrogenated amorphous carbon films compared to unmodified hydrogenated amorphous carbon films. Our in...
Main Authors: | A. A. Ogwu, T. I. T. Okpalugo, J. A. D. McLaughlin |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2012-09-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4742852 |
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