High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency

High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency

<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bip...

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Bibliographic Details
Main Authors: Str&#253;hal Z, Pavl&#237;k J, &#352;&#237;cha J, He&#345;man D, Musil J
Format: Article
Language:English
Published: SpringerOpen 2007-01-01
Series:Nanoscale Research Letters
Subjects:
TiO<sub>2</sub>film
Hydrophilicity
Deposition rate
Unheated substrate
Dual magnetron sputtering
Polycarbonate
Online Access:http://dx.doi.org/10.1007/s11671-007-9042-z

Internet

http://dx.doi.org/10.1007/s11671-007-9042-z

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