Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films

Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films

Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and propertie...

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Bibliographic Details
Main Authors: A.R. Grayeli Korpi, Sahare Rezaee, C. Luna, Ş. Ţălu, A. Arman, A. Ahmadpourian
Format: Article
Language:English
Published: Elsevier 2017-01-01
Series:Results in Physics
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379717312020

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