Investigation of resistive switching and transport mechanisms of Al2O3/TiO2−x memristors under cryogenic conditions (1.5 K)
Resistive switching and transport mechanisms of Al2O3/TiO2−x memristor crosspoint devices have been investigated at cryogenic temperatures down to 1.5 K, for the future development of memristor-based cryogenic electronics. We report successful resistive switching of our devices in the temperature ra...
Main Authors: | Yann Beilliard, François Paquette, Frédéric Brousseau, Serge Ecoffey, Fabien Alibart, Dominique Drouin |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2020-02-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.5140994 |
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