Adsorption of Titanium Halides on Nitride and Oxide Surfaces During Atomic Layer Deposition: A DFT Study
Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO<sub>2</sub>. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor–substrate surface reactions is req...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-07-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/10/8/712 |