| Summary: | The dimensions of amorphized regions in phase-change memory cells are critical parameters to design devices for different applications. However, these dimensions are difficult to be determined by direct imaging. In this work, the length of amorphized regions in multiple identical Ge2Sb2Te5 (GST) line cells was extracted from electrical measurements. After each cell was programmed to an amorphous state, a sequence of increasing-amplitude post-reset voltage pulses separated by low-amplitude read DC sweeps was applied. When a post-reset voltage pulse with sufficient amplitude was applied to a given cell, the measured current and the post-pulse resistance increased drastically, indicating that the cell re-amorphized after threshold switching, melting, and quenching. The amorphized length was calculated using the measured voltage at which the threshold switching occurred and the expected drifted threshold field at that time. The measured threshold voltage values and, hence, the extracted amorphized length, generally increase linearly with the programmed resistance levels. However, significant variability arises from the intrinsically unique crystallization and amorphization processes in these devices. For example, cells programmed to an amorphous resistance of approx. 50 MΩ show threshold voltage values of 5.5–7.5 V, corresponding to amorphized length values of 290–395 nm. This unpredictable programming feature in phase-change memory devices can be utilized in hardware security applications.
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