An effect of dummy cathode on thickness uniformity in electroforming process
This study examines the solution for one of the most difficult problems of electroforming process “thickness deviation”. As an effective solution, an auxiliary electrode (dummy cathode) is considered. Generally, the thickness of an edge plating area is almost twice the center area or greater. An au...
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doaj-9dfa5377a6c04f36adbbfa50a524847e2020-11-24T22:31:46ZengElsevierResults in Physics2211-37972014-01-014C10711210.1016/j.rinp.2014.07.004An effect of dummy cathode on thickness uniformity in electroforming processChul-Woo Park0Kyoung-Yong Park1Kyungpook National University, Republic of KoreaKITECH (Korea Institute of Industrial Technology), Republic of Korea This study examines the solution for one of the most difficult problems of electroforming process “thickness deviation”. As an effective solution, an auxiliary electrode (dummy cathode) is considered. Generally, the thickness of an edge plating area is almost twice the center area or greater. An auxiliary electrode (intentionally attached dummy cathode) has helped to achieve more uniform thickness of the electroformed-nickel layer by preventing excessive electric charge. In addition, computer-aided analysis was performed to determine the optimal condition of electroforming process and to confirm the experimental result. http://www.sciencedirect.com/science/article/pii/S2211379714000308ElectroformingAuxiliary electrodeCurrent densityProbe pinThickness uniformity |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Chul-Woo Park Kyoung-Yong Park |
spellingShingle |
Chul-Woo Park Kyoung-Yong Park An effect of dummy cathode on thickness uniformity in electroforming process Results in Physics Electroforming Auxiliary electrode Current density Probe pin Thickness uniformity |
author_facet |
Chul-Woo Park Kyoung-Yong Park |
author_sort |
Chul-Woo Park |
title |
An effect of dummy cathode on thickness uniformity in electroforming process |
title_short |
An effect of dummy cathode on thickness uniformity in electroforming process |
title_full |
An effect of dummy cathode on thickness uniformity in electroforming process |
title_fullStr |
An effect of dummy cathode on thickness uniformity in electroforming process |
title_full_unstemmed |
An effect of dummy cathode on thickness uniformity in electroforming process |
title_sort |
effect of dummy cathode on thickness uniformity in electroforming process |
publisher |
Elsevier |
series |
Results in Physics |
issn |
2211-3797 |
publishDate |
2014-01-01 |
description |
This study examines the solution for one of the most difficult problems of electroforming process “thickness deviation”. As an effective solution, an auxiliary electrode (dummy cathode) is considered. Generally, the thickness of an edge plating area is almost twice the center area or greater. An auxiliary electrode (intentionally attached dummy cathode) has helped to achieve more uniform thickness of the electroformed-nickel layer by preventing excessive electric charge. In addition, computer-aided analysis was performed to determine the optimal condition of electroforming process and to confirm the experimental result.
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topic |
Electroforming Auxiliary electrode Current density Probe pin Thickness uniformity |
url |
http://www.sciencedirect.com/science/article/pii/S2211379714000308 |
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