Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

Bibliographic Details
Main Authors: Dédalo Sanz-Hernández, Amalio Fernández-Pacheco
Format: Article
Language:English
Published: Beilstein-Institut 2017-12-01
Series:Beilstein Journal of Nanotechnology
Subjects:
adsorption isotherm theory
BET model
continuum model
focused electron beam induced deposition
3D nanoprinting
Langmuir model
Online Access:https://doi.org/10.3762/bjnano.8.259
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spelling doaj-98de4abffcbc4332b24b1a9975db6a192020-11-25T00:03:47ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862017-12-01812591259110.3762/bjnano.8.2592190-4286-8-259Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorptionDédalo Sanz-Hernández0Amalio Fernández-Pacheco1Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United KingdomCavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdomhttps://doi.org/10.3762/bjnano.8.259adsorption isotherm theoryBET modelcontinuum modelfocused electron beam induced deposition3D nanoprintingLangmuir model
collection DOAJ
language English
format Article
sources DOAJ
author Dédalo Sanz-Hernández
Amalio Fernández-Pacheco
spellingShingle Dédalo Sanz-Hernández
Amalio Fernández-Pacheco
Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
Beilstein Journal of Nanotechnology
adsorption isotherm theory
BET model
continuum model
focused electron beam induced deposition
3D nanoprinting
Langmuir model
author_facet Dédalo Sanz-Hernández
Amalio Fernández-Pacheco
author_sort Dédalo Sanz-Hernández
title Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
title_short Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
title_full Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
title_fullStr Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
title_full_unstemmed Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
title_sort correction: modelling focused electron beam induced deposition beyond langmuir adsorption
publisher Beilstein-Institut
series Beilstein Journal of Nanotechnology
issn 2190-4286
publishDate 2017-12-01
topic adsorption isotherm theory
BET model
continuum model
focused electron beam induced deposition
3D nanoprinting
Langmuir model
url https://doi.org/10.3762/bjnano.8.259
work_keys_str_mv AT dedalosanzhernandez correctionmodellingfocusedelectronbeaminduceddepositionbeyondlangmuiradsorption
AT amaliofernandezpacheco correctionmodellingfocusedelectronbeaminduceddepositionbeyondlangmuiradsorption
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