Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering

Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering

Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (<i>T</i><sub>s</sub>) and target&#8315;substrate distance (<i>D</i><sub>t&#8315;s</sub>) on phase stru...

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Bibliographic Details
Main Authors: Song Zhang, Tingting Wang, Ziyu Zhang, Jun Li, Rong Tu, Qiang Shen, Chuanbin Wang, Guoqiang Luo, Lianmeng Zhang
Format: Article
Language:English
Published: MDPI AG 2019-01-01
Series:Materials
Subjects:
Vanadium films
magnetron sputtering
substrate temperature (<i>T</i><sub>s</sub>)
target–substrate distance (<i>D</i><sub>t–s</sub>)
microstructure
oxidation behavior
Online Access:https://www.mdpi.com/1996-1944/12/3/425

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