| Summary: | Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (<i>T</i><sub>s</sub>) and target⁻substrate distance (<i>D</i><sub>t⁻s</sub>) on phase structure and surface morphology of V films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscope (AFM) and transmission electron microscopy (TEM). The results show that the crystallinity of the V films increases with increasing <i>T</i><sub>s</sub> and decreasing <i>D</i><sub>t⁻s</sub>. The film deposited at <i>T</i><sub>s</sub> = 400 °C and <i>D</i><sub>t⁻s</sub> = 60 mm exhibits the best crystallinity and <111> preferred orientation with a regular tetrahedral surface morphology. Oxidation behavior of the V thin films has also been studied by X-ray photoelectron spectroscopy (XPS).
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