Photoresist as a choice of molecularly thin gate dielectrics in graphene-based devices
Ultra-thin polymeric dielectrics are of great interest for the ever-increasing development of high-performance novel electronics. Up to date, the fabrication of polymer layers as thin as few nanometers is still an extremely demanding process. Here, we report a facile method to fabricate molecularly...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2021-03-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0034996 |