Kinetic analysis of the chemical processes in the decomposition of gaseous dielectrics by a non-equilibrium plasma - part 1: CF4 and CF4/O2

Numerical integration of the coupled differential equations which describe a chemical reacting system and sensitivity analysis are becoming increasingly important tools in chemical kinetics. In this work, a numerical modelling analysis of the chemical processes in the gas-phase decomposition of pure...

Full description

Bibliographic Details
Main Authors: Bauerfeldt Glauco F., Arbilla Graciela
Format: Article
Language:English
Published: Sociedade Brasileira de Química 2000-01-01
Series:Journal of the Brazilian Chemical Society
Subjects:
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532000000200004