Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance

Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in b...

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Main Authors: Md. Khairul Hoque, James A. Behan, James Creel, James G. Lunney, Tatiana S. Perova, Paula E. Colavita
Format: Article
Language:English
Published: Frontiers Media S.A. 2020-11-01
Series:Frontiers in Chemistry
Subjects:
Online Access:https://www.frontiersin.org/articles/10.3389/fchem.2020.593932/full
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spelling doaj-8fe32fe6929046debe5cbc13809985a22020-11-25T04:09:18ZengFrontiers Media S.A.Frontiers in Chemistry2296-26462020-11-01810.3389/fchem.2020.593932593932Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic PerformanceMd. Khairul Hoque0James A. Behan1James Creel2James G. Lunney3Tatiana S. Perova4Paula E. Colavita5Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and SFI Research Centre for Advanced Materials and BioEngineering Research (AMBER) Research Centres, School of Chemistry, Trinity College Dublin, Dublin, IrelandCentre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and SFI Research Centre for Advanced Materials and BioEngineering Research (AMBER) Research Centres, School of Chemistry, Trinity College Dublin, Dublin, IrelandCentre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and SFI Research Centre for Advanced Materials and BioEngineering Research (AMBER) Research Centres, School of Chemistry, Trinity College Dublin, Dublin, IrelandSchool of Physics, Trinity College Dublin, Dublin, IrelandSchool of Engineering, Trinity College Dublin, College Green, Dublin, IrelandCentre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and SFI Research Centre for Advanced Materials and BioEngineering Research (AMBER) Research Centres, School of Chemistry, Trinity College Dublin, Dublin, IrelandNitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in both surface functionalization and amorphization of the carbon electrode materials. X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy were used to monitor composition and carbon organization: results indicate incorporation of predominantly pyrrolic-N sites after relatively short treatment cycles (5 min or less), accompanied by an initial etching of amorphous regions followed by a slower process of amorphization of graphitized clusters. By leveraging the difference in the rate of these two processes it was possible to investigate the effects of chemical N-sites and C-defect sites on their electrochemical response. The materials were tested as metal-free electrocatalysts in the oxygen reduction reaction (ORR) in alkaline conditions. We find that the introduction of predominantly pyrrolic-N sites via plasma modification results in improvements in selectivity in the ORR, relative to the nitrogen-free precursor material. Introduction of defects through prolonged plasma exposure has a more pronounced and beneficial effect on ORR descriptors than introduction of N-sites alone, leading to both increased onset potentials, and reduced hydroperoxide yields relative to the nitrogen-free carbon material. Our results suggest that increased structural disorder/heterogeneity results in the introduction of carbon sites that might either serve as main activity sites, or that enhance the effects of N-functionalities in the ORR via synergistic effects.https://www.frontiersin.org/articles/10.3389/fchem.2020.593932/fullcarbonelectrocatalysis and functionalized/modified electrodesmetal-freeamorphous carbon (a-C)nitrogen plasma activationnitrogen plasma (nitridation)
collection DOAJ
language English
format Article
sources DOAJ
author Md. Khairul Hoque
James A. Behan
James Creel
James G. Lunney
Tatiana S. Perova
Paula E. Colavita
spellingShingle Md. Khairul Hoque
James A. Behan
James Creel
James G. Lunney
Tatiana S. Perova
Paula E. Colavita
Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
Frontiers in Chemistry
carbon
electrocatalysis and functionalized/modified electrodes
metal-free
amorphous carbon (a-C)
nitrogen plasma activation
nitrogen plasma (nitridation)
author_facet Md. Khairul Hoque
James A. Behan
James Creel
James G. Lunney
Tatiana S. Perova
Paula E. Colavita
author_sort Md. Khairul Hoque
title Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
title_short Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
title_full Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
title_fullStr Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
title_full_unstemmed Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance
title_sort reactive plasma n-doping of amorphous carbon electrodes: decoupling disorder and chemical effects on capacitive and electrocatalytic performance
publisher Frontiers Media S.A.
series Frontiers in Chemistry
issn 2296-2646
publishDate 2020-11-01
description Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in both surface functionalization and amorphization of the carbon electrode materials. X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy were used to monitor composition and carbon organization: results indicate incorporation of predominantly pyrrolic-N sites after relatively short treatment cycles (5 min or less), accompanied by an initial etching of amorphous regions followed by a slower process of amorphization of graphitized clusters. By leveraging the difference in the rate of these two processes it was possible to investigate the effects of chemical N-sites and C-defect sites on their electrochemical response. The materials were tested as metal-free electrocatalysts in the oxygen reduction reaction (ORR) in alkaline conditions. We find that the introduction of predominantly pyrrolic-N sites via plasma modification results in improvements in selectivity in the ORR, relative to the nitrogen-free precursor material. Introduction of defects through prolonged plasma exposure has a more pronounced and beneficial effect on ORR descriptors than introduction of N-sites alone, leading to both increased onset potentials, and reduced hydroperoxide yields relative to the nitrogen-free carbon material. Our results suggest that increased structural disorder/heterogeneity results in the introduction of carbon sites that might either serve as main activity sites, or that enhance the effects of N-functionalities in the ORR via synergistic effects.
topic carbon
electrocatalysis and functionalized/modified electrodes
metal-free
amorphous carbon (a-C)
nitrogen plasma activation
nitrogen plasma (nitridation)
url https://www.frontiersin.org/articles/10.3389/fchem.2020.593932/full
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