A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications

A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications

Plasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large are...

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Bibliographic Details
Main Author: Yun Seon Do
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Access
Subjects:
Laser interference lithography
nano patterning
surface plasmon
plasmonic filter
Online Access:https://ieeexplore.ieee.org/document/8531589/
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spelling doaj-8fb77b1c6bc84d97b7d79e0ccc3593612021-03-29T21:37:04ZengIEEEIEEE Access2169-35362018-01-016689616896710.1109/ACCESS.2018.28804568531589A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical ApplicationsYun Seon Do0https://orcid.org/0000-0002-0715-8033School of Electronics Engineering, Kyungpook National University, Daegu, South KoreaPlasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large areas. The optical structure of these plasmonic filters consists of 2-D hole arrays in a thin metal film. Although laser interference lithography technology allows a high accuracy of regularity across the whole fabrication region, the exposure light is easily disturbed by vibrations or dust in the air. The suggested process enhances the accuracy and reproducibility of nanopatterns, which also exhibit a high performance. This paper will help realize plasmonic filters in conjunction with industry.https://ieeexplore.ieee.org/document/8531589/Laser interference lithographynano patterningsurface plasmonplasmonic filter
collection DOAJ
language English
format Article
sources DOAJ
author Yun Seon Do
spellingShingle Yun Seon Do
A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
IEEE Access
Laser interference lithography
nano patterning
surface plasmon
plasmonic filter
author_facet Yun Seon Do
author_sort Yun Seon Do
title A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
title_short A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
title_full A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
title_fullStr A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
title_full_unstemmed A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications
title_sort highly reproducible fabrication process for large-area plasmonic filters for optical applications
publisher IEEE
series IEEE Access
issn 2169-3536
publishDate 2018-01-01
description Plasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large areas. The optical structure of these plasmonic filters consists of 2-D hole arrays in a thin metal film. Although laser interference lithography technology allows a high accuracy of regularity across the whole fabrication region, the exposure light is easily disturbed by vibrations or dust in the air. The suggested process enhances the accuracy and reproducibility of nanopatterns, which also exhibit a high performance. This paper will help realize plasmonic filters in conjunction with industry.
topic Laser interference lithography
nano patterning
surface plasmon
plasmonic filter
url https://ieeexplore.ieee.org/document/8531589/
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AT yunseondo highlyreproduciblefabricationprocessforlargeareaplasmonicfiltersforopticalapplications
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