Angular distribution of hybridization in sputtered carbon thin film

Angular distribution of hybridization in sputtered carbon thin film

The sp3/sp2 ratio of sputtered carbon thin film depends on the ion bombardment process and tailors the physical properties of carbon thin film. In present work, we report the angular distribution of hybridization in magnetron sputtered carbon thin film for the first time. By x-ray photoelectron spec...

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Main Authors: Y. Liu, H. Wang, Z. C. Wei
Format: Article
Language:English
Published: AIP Publishing LLC 2017-08-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4990858
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spelling doaj-8eb08f4cc67a4c9d973ba845d07cd0532020-11-24T21:29:00ZengAIP Publishing LLCAIP Advances2158-32262017-08-0178085303085303-610.1063/1.4990858014708ADVAngular distribution of hybridization in sputtered carbon thin filmY. Liu0H. Wang1Z. C. Wei2Department of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. ChinaDepartment of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. ChinaDepartment of Physics, Capital Normal University, Beijing Key Laboratory of Metamaterials and Devices, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Technology, Beijing 100048, P.R. ChinaThe sp3/sp2 ratio of sputtered carbon thin film depends on the ion bombardment process and tailors the physical properties of carbon thin film. In present work, we report the angular distribution of hybridization in magnetron sputtered carbon thin film for the first time. By x-ray photoelectron spectra analyses, it is found that the sp3/sp2 ratio increases linearly with increasing the deposition angle from 0 to 90 degree, which could be attributed to the enhancement of direct knocking-out of near-surface target atoms. In addition, we also derive the sp3/sp2 ratio by simulation on complex permittivity in terahertz frequency using a modified percolation approximation tunneling model. Those derived data consist with the results from x-ray photoelectron spectroscopy.http://dx.doi.org/10.1063/1.4990858
collection DOAJ
language English
format Article
sources DOAJ
author Y. Liu
H. Wang
Z. C. Wei
spellingShingle Y. Liu
H. Wang
Z. C. Wei
Angular distribution of hybridization in sputtered carbon thin film
AIP Advances
author_facet Y. Liu
H. Wang
Z. C. Wei
author_sort Y. Liu
title Angular distribution of hybridization in sputtered carbon thin film
title_short Angular distribution of hybridization in sputtered carbon thin film
title_full Angular distribution of hybridization in sputtered carbon thin film
title_fullStr Angular distribution of hybridization in sputtered carbon thin film
title_full_unstemmed Angular distribution of hybridization in sputtered carbon thin film
title_sort angular distribution of hybridization in sputtered carbon thin film
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2017-08-01
description The sp3/sp2 ratio of sputtered carbon thin film depends on the ion bombardment process and tailors the physical properties of carbon thin film. In present work, we report the angular distribution of hybridization in magnetron sputtered carbon thin film for the first time. By x-ray photoelectron spectra analyses, it is found that the sp3/sp2 ratio increases linearly with increasing the deposition angle from 0 to 90 degree, which could be attributed to the enhancement of direct knocking-out of near-surface target atoms. In addition, we also derive the sp3/sp2 ratio by simulation on complex permittivity in terahertz frequency using a modified percolation approximation tunneling model. Those derived data consist with the results from x-ray photoelectron spectroscopy.
url http://dx.doi.org/10.1063/1.4990858
work_keys_str_mv AT yliu angulardistributionofhybridizationinsputteredcarbonthinfilm
AT hwang angulardistributionofhybridizationinsputteredcarbonthinfilm
AT zcwei angulardistributionofhybridizationinsputteredcarbonthinfilm
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