Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification

Rapid growth and ultra-precision machining of large-size KDP (KH2PO4) crystals with high laser damage resistance are tough challenges in the development of large laser systems. It is of high interest and practical significance to have theoretical models for scientists and manufacturers to determine...

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Main Authors: Jian Cheng, Mingjun Chen, Kyle Kafka, Drake Austin, Jinghe Wang, Yong Xiao, Enam Chowdhury
Format: Article
Language:English
Published: AIP Publishing LLC 2016-03-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4945415
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spelling doaj-8ba2ea2662054d75b43fad9155165ed22020-11-25T01:12:21ZengAIP Publishing LLCAIP Advances2158-32262016-03-0163035221035221-710.1063/1.4945415098603ADVDetermination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verificationJian Cheng0Mingjun Chen1Kyle Kafka2Drake Austin3Jinghe Wang4Yong Xiao5Enam Chowdhury6Center for Precision Engineering, School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, ChinaCenter for Precision Engineering, School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, ChinaDepartment of Physics, The Ohio State University, 191 W. Woodruff Ave, Columbus, OH 43210, USADepartment of Physics, The Ohio State University, 191 W. Woodruff Ave, Columbus, OH 43210, USACenter for Precision Engineering, School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, ChinaCenter for Precision Engineering, School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, ChinaDepartment of Physics, The Ohio State University, 191 W. Woodruff Ave, Columbus, OH 43210, USARapid growth and ultra-precision machining of large-size KDP (KH2PO4) crystals with high laser damage resistance are tough challenges in the development of large laser systems. It is of high interest and practical significance to have theoretical models for scientists and manufacturers to determine the laser-induced damage threshold (LIDT) of actually prepared KDP optics. Here, we numerically and experimentally investigate the laser-induced damage on KDP crystals in ultra-short pulse laser regime. On basis of the rate equation for free electron generation, a model dedicated to predicting the LIDT is developed by considering the synergistic effect of photoionization, impact ionization and decay of electrons. Laser damage tests are performed to measure the single-pulse LIDT with several testing protocols. The testing results combined with previously reported experimental data agree well with those calculated by the model. By taking the light intensification into consideration, the model is successfully applied to quantitatively evaluate the effect of surface flaws inevitably introduced in the preparation processes on the laser damage resistance of KDP crystals. This work can not only contribute to further understanding of the laser damage mechanisms of optical materials, but also provide available models for evaluating the laser damage resistance of exquisitely prepared optical components used in high power laser systems.http://dx.doi.org/10.1063/1.4945415
collection DOAJ
language English
format Article
sources DOAJ
author Jian Cheng
Mingjun Chen
Kyle Kafka
Drake Austin
Jinghe Wang
Yong Xiao
Enam Chowdhury
spellingShingle Jian Cheng
Mingjun Chen
Kyle Kafka
Drake Austin
Jinghe Wang
Yong Xiao
Enam Chowdhury
Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
AIP Advances
author_facet Jian Cheng
Mingjun Chen
Kyle Kafka
Drake Austin
Jinghe Wang
Yong Xiao
Enam Chowdhury
author_sort Jian Cheng
title Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
title_short Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
title_full Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
title_fullStr Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
title_full_unstemmed Determination of ultra-short laser induced damage threshold of KH2PO4 crystal: Numerical calculation and experimental verification
title_sort determination of ultra-short laser induced damage threshold of kh2po4 crystal: numerical calculation and experimental verification
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2016-03-01
description Rapid growth and ultra-precision machining of large-size KDP (KH2PO4) crystals with high laser damage resistance are tough challenges in the development of large laser systems. It is of high interest and practical significance to have theoretical models for scientists and manufacturers to determine the laser-induced damage threshold (LIDT) of actually prepared KDP optics. Here, we numerically and experimentally investigate the laser-induced damage on KDP crystals in ultra-short pulse laser regime. On basis of the rate equation for free electron generation, a model dedicated to predicting the LIDT is developed by considering the synergistic effect of photoionization, impact ionization and decay of electrons. Laser damage tests are performed to measure the single-pulse LIDT with several testing protocols. The testing results combined with previously reported experimental data agree well with those calculated by the model. By taking the light intensification into consideration, the model is successfully applied to quantitatively evaluate the effect of surface flaws inevitably introduced in the preparation processes on the laser damage resistance of KDP crystals. This work can not only contribute to further understanding of the laser damage mechanisms of optical materials, but also provide available models for evaluating the laser damage resistance of exquisitely prepared optical components used in high power laser systems.
url http://dx.doi.org/10.1063/1.4945415
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