Time-Efficient High-Resolution Large-Area Nano-Patterning of Silicon Dioxide

Time-Efficient High-Resolution Large-Area Nano-Patterning of Silicon Dioxide

A nano-patterning approach on silicon dioxide (SiO2) material, which could be used for the selective growth of III-V nanowires in photovoltaic applications, is demonstrated. In this process, a silicon (Si) stamp with nanopillar structures was first fabricated using electron-beam lithography (EBL) fo...

Full description

Bibliographic Details
Main Authors: Li Lin, Yiyu Ou, Martin Aagesen, Flemming Jensen, Berit Herstrøm, Haiyan Ou
Format: Article
Language:English
Published: MDPI AG 2017-01-01
Series:Micromachines
Subjects:
electron-beam lithography
nanoimprint lithography
nano-patterning of silicon dioxide
Online Access:http://www.mdpi.com/2072-666X/8/1/13

Similar Items

Similar Items