A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
In this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic...
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doaj-875a583cec0b4e39b189953f78f0c79e2020-11-25T02:04:34ZengMDPI AGSensors1424-82202020-05-01202722272210.3390/s20092722A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon FiltersZicheng Zhou0Honglae Sohn1Department of Chemistry, Chosun University, Gwangju 61452, KoreaDepartment of Chemistry, Chosun University, Gwangju 61452, KoreaIn this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic vapor sensing. When the wavelength of the resonance peak from the rugate PSi filters is engineered to overlap with the emission band of the PL from the PSi quantum dots, the PL intensity is amplified, thus reducing the full width at half maximum (FWHM) of the PL band from 154 nm to 22 nm. The rugate PSi filters samples were fabricated by electrochemical etching of highly doped n-type silicon under illumination. The etching solution consisted of a 1:1 volume mixture of 48% hydrofluoric acid and absolute ethanol and photoluminescent rugate PSi filter was fabricated by etching while using a periodic sinusoidal wave current with 10 cycles. The obtained samples were characterized by scanning electron microscopy (SEM), and both reflection redshift and PL quenching were measured under exposure to organic vapors. The reflection redshift and PL quenching were both affected by the vapor pressure and dipole moment of the organic species.https://www.mdpi.com/1424-8220/20/9/2722reflectionphotoluminescenceporous siliconrugateorganic vapor |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Zicheng Zhou Honglae Sohn |
spellingShingle |
Zicheng Zhou Honglae Sohn A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters Sensors reflection photoluminescence porous silicon rugate organic vapor |
author_facet |
Zicheng Zhou Honglae Sohn |
author_sort |
Zicheng Zhou |
title |
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters |
title_short |
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters |
title_full |
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters |
title_fullStr |
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters |
title_full_unstemmed |
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters |
title_sort |
novel chemical gas vapor sensor based on photoluminescence enhancement of rugate porous silicon filters |
publisher |
MDPI AG |
series |
Sensors |
issn |
1424-8220 |
publishDate |
2020-05-01 |
description |
In this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic vapor sensing. When the wavelength of the resonance peak from the rugate PSi filters is engineered to overlap with the emission band of the PL from the PSi quantum dots, the PL intensity is amplified, thus reducing the full width at half maximum (FWHM) of the PL band from 154 nm to 22 nm. The rugate PSi filters samples were fabricated by electrochemical etching of highly doped n-type silicon under illumination. The etching solution consisted of a 1:1 volume mixture of 48% hydrofluoric acid and absolute ethanol and photoluminescent rugate PSi filter was fabricated by etching while using a periodic sinusoidal wave current with 10 cycles. The obtained samples were characterized by scanning electron microscopy (SEM), and both reflection redshift and PL quenching were measured under exposure to organic vapors. The reflection redshift and PL quenching were both affected by the vapor pressure and dipole moment of the organic species. |
topic |
reflection photoluminescence porous silicon rugate organic vapor |
url |
https://www.mdpi.com/1424-8220/20/9/2722 |
work_keys_str_mv |
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