A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters

In this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic...

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Main Authors: Zicheng Zhou, Honglae Sohn
Format: Article
Language:English
Published: MDPI AG 2020-05-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/20/9/2722
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spelling doaj-875a583cec0b4e39b189953f78f0c79e2020-11-25T02:04:34ZengMDPI AGSensors1424-82202020-05-01202722272210.3390/s20092722A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon FiltersZicheng Zhou0Honglae Sohn1Department of Chemistry, Chosun University, Gwangju 61452, KoreaDepartment of Chemistry, Chosun University, Gwangju 61452, KoreaIn this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic vapor sensing. When the wavelength of the resonance peak from the rugate PSi filters is engineered to overlap with the emission band of the PL from the PSi quantum dots, the PL intensity is amplified, thus reducing the full width at half maximum (FWHM) of the PL band from 154 nm to 22 nm. The rugate PSi filters samples were fabricated by electrochemical etching of highly doped n-type silicon under illumination. The etching solution consisted of a 1:1 volume mixture of 48% hydrofluoric acid and absolute ethanol and photoluminescent rugate PSi filter was fabricated by etching while using a periodic sinusoidal wave current with 10 cycles. The obtained samples were characterized by scanning electron microscopy (SEM), and both reflection redshift and PL quenching were measured under exposure to organic vapors. The reflection redshift and PL quenching were both affected by the vapor pressure and dipole moment of the organic species.https://www.mdpi.com/1424-8220/20/9/2722reflectionphotoluminescenceporous siliconrugateorganic vapor
collection DOAJ
language English
format Article
sources DOAJ
author Zicheng Zhou
Honglae Sohn
spellingShingle Zicheng Zhou
Honglae Sohn
A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
Sensors
reflection
photoluminescence
porous silicon
rugate
organic vapor
author_facet Zicheng Zhou
Honglae Sohn
author_sort Zicheng Zhou
title A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
title_short A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
title_full A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
title_fullStr A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
title_full_unstemmed A Novel Chemical Gas Vapor Sensor Based on Photoluminescence Enhancement of Rugate Porous Silicon Filters
title_sort novel chemical gas vapor sensor based on photoluminescence enhancement of rugate porous silicon filters
publisher MDPI AG
series Sensors
issn 1424-8220
publishDate 2020-05-01
description In this study, an innovative rugate filter configuration porous silicon (PSi) with enhanced photoluminescence intensity was fabricated. The fabricated PSi exhibited dual optical properties with both sharp optical reflectivity and sharp photoluminescence (PL), and it was developed for use in organic vapor sensing. When the wavelength of the resonance peak from the rugate PSi filters is engineered to overlap with the emission band of the PL from the PSi quantum dots, the PL intensity is amplified, thus reducing the full width at half maximum (FWHM) of the PL band from 154 nm to 22 nm. The rugate PSi filters samples were fabricated by electrochemical etching of highly doped n-type silicon under illumination. The etching solution consisted of a 1:1 volume mixture of 48% hydrofluoric acid and absolute ethanol and photoluminescent rugate PSi filter was fabricated by etching while using a periodic sinusoidal wave current with 10 cycles. The obtained samples were characterized by scanning electron microscopy (SEM), and both reflection redshift and PL quenching were measured under exposure to organic vapors. The reflection redshift and PL quenching were both affected by the vapor pressure and dipole moment of the organic species.
topic reflection
photoluminescence
porous silicon
rugate
organic vapor
url https://www.mdpi.com/1424-8220/20/9/2722
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