In-situ characterization of the development step of high-resolution e-beam resists
The optimization of the development conditions in a lithography process is crucial for the overall lithographic performance while the study of the development step provides useful information regarding the properties of the lithographic material. In this work, high resolution e-beam resists are stud...
| Main Authors: | , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2020-11-01
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| Series: | Micro and Nano Engineering |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007220300253 |