Intelligent Photolithography Corrections Using Dimensionality Reductions

Intelligent Photolithography Corrections Using Dimensionality Reductions

With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning. Machine learning has emerged in OPC/EPC problems because conventional optical-solver-based OPC is time-consuming, and there...

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Bibliographic Details
Main Authors: Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin
Format: Article
Language:English
Published: IEEE 2019-01-01
Series:IEEE Photonics Journal
Subjects:
Lithography
Diffractive imaging
Technologies for computing.
Online Access:https://ieeexplore.ieee.org/document/8820144/

Internet

https://ieeexplore.ieee.org/document/8820144/

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